1. Identity statement | |
Reference Type | Journal Article |
Site | mtc-m16.sid.inpe.br |
Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
Identifier | 6qtX3pFwXQZ3r59YDa/KbNQw |
Repository | sid.inpe.br/iris@1916/2006/02.16.15.37 (restricted access) |
Last Update | 2006:02.16.15.37.00 (UTC) administrator |
Metadata Repository | sid.inpe.br/iris@1916/2006/02.16.15.38.01 |
Metadata Last Update | 2018:06.05.01.20.24 (UTC) administrator |
Secondary Key | INPE-13534-PRE/8747 |
ISSN | 0257-8972 |
Citation Key | RossiUedaBarr:2001:PlImIo |
Title | Plasma immersion ion implantation experiments with long and short rise time pulses using high voltage hard tube pulser |
Year | 2001 |
Access Date | 2024, May 19 |
Secondary Type | PRE PI |
Number of Files | 1 |
Size | 134 KiB |
|
2. Context | |
Author | 1 Rossi, José Oswaldo 2 Ueda, Mario 3 Barroso, Joaquim Jose |
Resume Identifier | 1 2 8JMKD3MGP5W/3C9JHSB |
Group | 1 LAP-INPE-MCT-BR |
Affiliation | 1 Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasmas, (INPE, LAP) |
Journal | Surface and Coatings Technology |
Volume | 136 |
Pages | 43-46 |
History (UTC) | 2006-02-16 15:38:02 :: vinicius -> administrator :: 2008-06-10 22:25:18 :: administrator -> vinicius :: 2011-05-22 02:56:47 :: vinicius -> administrator :: 2018-06-05 01:20:24 :: administrator -> marciana :: 2001 |
|
3. Content and structure | |
Is the master or a copy? | is the master |
Content Stage | completed |
Transferable | 1 |
Content Type | External Contribution |
Keywords | High voltage pulse generator Plasma immersion implantation Rise and fall times of high voltage pulses |
Abstract | The performances of two high voltage pulse generators using different circuit configurations for the treatment of metals and polymer materials by plasma immersion ion implantation are assessed. Both pulse generators were built in the circuit category of hard tube type which uses a high power tetrode as a fast on]off switch to control the pulse duration. The first pulse generator has . a maximum capacity of 60 kVr10 A at a repetition frequency of 700 Hz with a long pulse rise time of the order of 40 ms while the second one is able to operate with full voltage and current of 30 kV and 30 A at 1 kHz with a very short pulse rise time less . than 1 ms . It is shown that the better performance of the latter pulser in terms of rise time is due to a different configuration circuit employed in its construction. Target voltage and implantation current from the application of both pulsers to a plasma glow discharge are discussed using a stationary plasma circuit model. |
Area | FISPLASMA |
Arrangement | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma immersion ion... |
doc Directory Content | access |
source Directory Content | there are no files |
agreement Directory Content | there are no files |
|
4. Conditions of access and use | |
Language | en |
Target File | 63.pdf |
User Group | administrator vinicius |
Visibility | shown |
Copy Holder | SID/SCD |
Archiving Policy | denypublisher denyfinaldraft24 |
Read Permission | deny from all and allow from 150.163 |
|
5. Allied materials | |
Next Higher Units | 8JMKD3MGPCW/3ET2RFS |
Dissemination | WEBSCI; PORTALCAPES. |
Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
|
6. Notes | |
Empty Fields | alternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository month nextedition notes number orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype |
|
7. Description control | |
e-Mail (login) | marciana |
update | |
|